robmorin0-hash/multibeam-ebl-open

Open architecture multi-beam direct-write electron-beam lithography — Morin 2026 v5. CC BY 4.0 papers + MIT code. Sub-10 nm capable, ~$37M/tool vs EUV $200-400M, multi-vendor supply chain, no patent claims.

2 best points · 0 comments · 1 Hacker News post · 6 GitHub stars · View on GitHub

Hacker News discussions

• Open architecture multi-beam EBL for sub-10nm sovereign chip manufacturing (2 points, 0 comments, by TheDoctorII, 2026-05-17)